Imaging of near-field interference patterns by a-SNOM – influence of illumination wavelength and polarization state

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dc.contributor.authorDvořák, Petrcs
dc.contributor.authorÉdes, Zoltáncs
dc.contributor.authorKvapil, Michalcs
dc.contributor.authorŠamořil, Tomášcs
dc.contributor.authorLigmajer, Filipcs
dc.contributor.authorHrtoň, Martincs
dc.contributor.authorKalousek, Radekcs
dc.contributor.authorKřápek, Vlastimilcs
dc.contributor.authorDub, Petrcs
dc.contributor.authorSpousta, Jiřícs
dc.contributor.authorVarga, Petercs
dc.contributor.authorŠikola, Tomášcs
dc.coverage.issue14cs
dc.coverage.volume25cs
dc.date.accessioned2020-08-04T11:03:00Z
dc.date.available2020-08-04T11:03:00Z
dc.date.issued2017-07-05cs
dc.description.abstractScanning near-field optical microscopy (SNOM) in combination with interference structures is a powerful tool for imaging and analysis of surface plasmon polaritons (SPPs). However, the correct interpretation of SNOM images requires profound understanding of principles behind their formation. To study fundamental principles of SNOM imaging in detail, we performed spectroscopic measurements by an aperture-type SNOM setup equipped with a supercontinuum laser and a polarizer, which gave us all the degrees of freedom necessary for our investigation. The series of wavelength- and polarization-resolved measurements, together with results of numerical simulations, then allowed us to identify the role of individual near-field components in formation of SNOM images, and to show that the out-of-plane component generally dominates within a broad range of parameters explored in our study. Our results challenge the widespread notion that this component does not couple to the a-SNOM probe and indicate that the issue of SNOM probe sensitivity towards the in-plane and out-of-plane near-field components – one of the most challenging tasks of near field interference SNOM measurements – is not yet fully resolved.en
dc.description.abstractČlánek se zabývá vlivem jednotlivých komponent blízkého pole na tvar interferenčních obrazců měřených pomocí rastrovací optické mikroskopie v blízkém poli.cs
dc.formattextcs
dc.format.extent16560-16573cs
dc.format.mimetypeapplication/pdfcs
dc.identifier.citationOPTICS EXPRESS. 2017, vol. 25, issue 14, p. 16560-16573.en
dc.identifier.doi10.1364/OE.25.016560cs
dc.identifier.issn1094-4087cs
dc.identifier.other135516cs
dc.identifier.urihttp://hdl.handle.net/11012/84174
dc.language.isoencs
dc.publisherOptical Society of Americacs
dc.relation.ispartofOPTICS EXPRESScs
dc.relation.urihttps://www.osapublishing.org/oe/fulltext.cfm?uri=oe-25-14-16560&id=369005cs
dc.rights(C) Optical Society of Americacs
dc.rights.accessopenAccesscs
dc.rights.sherpahttp://www.sherpa.ac.uk/romeo/issn/1094-4087/cs
dc.subjectplasmonicsen
dc.subjectcomponentsen
dc.subjectspectroscopyen
dc.subjectinterferometric imagingen
dc.subjectplazmonika
dc.subjectsložky
dc.subjectspektroskopie
dc.subjectinterferometrické zobrazování
dc.titleImaging of near-field interference patterns by a-SNOM – influence of illumination wavelength and polarization stateen
dc.title.alternativeZobrazování interferenčních obrazců v blízkém poli pomocí a-SNOM – vliv vlnové délky a polarizace osvitucs
dc.type.driverarticleen
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen
sync.item.dbidVAV-135516en
sync.item.dbtypeVAVen
sync.item.insts2022.05.02 00:53:46en
sync.item.modts2022.05.02 00:14:53en
thesis.grantorVysoké učení technické v Brně. Fakulta strojního inženýrství. Ústav fyzikálního inženýrstvícs
thesis.grantorVysoké učení technické v Brně. Středoevropský technologický institut VUT. Příprava a charakterizace nanostrukturcs
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Ústav fyzikálního inženýrství
Příprava a charakterizace nanostruktur