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dc.contributor.authorCharvot, Jaroslavcs
dc.contributor.authorZazpe Mendioroz, Raúlcs
dc.contributor.authorMacák, Jancs
dc.contributor.authorBureš, Filipcs
dc.date.accessioned2021-11-15T11:55:32Z
dc.date.available2021-11-15T11:55:32Z
dc.date.issued2021-03-16cs
dc.identifier.citationACS OMEGA. 2021, vol. 6, issue 10, p. 6554-6558.en
dc.identifier.issn2470-1343cs
dc.identifier.other173123cs
dc.identifier.urihttp://hdl.handle.net/11012/202274
dc.description.abstractOrganoselenium compounds with perspective application as Se precursors for atomic layer deposition have been reviewed. The originally limited portfolio of available Se precursors such as H2Se and diethyl(di)selenide has recently been extended by bis trialkylsilyl)selenides, bis(trialkylstannyl)selenides, cyclic selenides, and tetrakis(N,N-dimethyldithiocarbamate)-selenium. Their structural aspects, property tuning, fundamental properties, and preparations are discussed. It turned out that symmetric four- and six-membered cyclic silyl selenides possess well-balanced reactivity/stability, facile and cost-effective synthesis starting from inexpensive and readily available chlorosilanes, improved resistance toward air and moisture, easy handling, sufficient volatility, thermal resistance, and complete gas-to-solid phase exchange reaction with MoCl5, affording MoSe2 nanostructures. These properties make them the most promising Se precursor developed for atomic layer deposition so far.en
dc.formattextcs
dc.format.extent6554-6558cs
dc.format.mimetypeapplication/pdfcs
dc.language.isoencs
dc.publisherAmerican Chemical Societycs
dc.relation.ispartofACS OMEGAcs
dc.relation.urihttps://pubs.acs.org/doi/10.1021/acsomega.1c00223cs
dc.rightsCreative Commons Attribution-NonCommercial-NoDerivatives 4.0 Internationalcs
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/cs
dc.subjectOrganoselenium compoundsen
dc.titleOrganoselenium Precursors for Atomic Layer Depositionen
thesis.grantorVysoké učení technické v Brně. Středoevropský technologický institut VUT. Pokročilé nízkodimenzionální nanomateriálycs
sync.item.dbidVAV-173123en
sync.item.dbtypeVAVen
sync.item.insts2021.12.29 00:54:57en
sync.item.modts2021.12.29 00:16:56en
dc.coverage.issue10cs
dc.coverage.volume6cs
dc.identifier.doi10.1021/acsomega.1c00223cs
dc.rights.accessopenAccesscs
dc.rights.sherpahttp://www.sherpa.ac.uk/romeo/issn/2470-1343/cs
dc.type.driverarticleen
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen


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Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International
Except where otherwise noted, this item's license is described as Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International