Optical characterization of inhomogeneous thin films with randomly rough boundaries
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An inhomogeneous polymer-like thin film was deposited by the plasma enhanced chemical vapor deposition onto silicon single-crystal substrate whose surface was roughened by anodic oxidation. The inhomogeneous thin film with randomly rough boundaries was created as a result. This sample was studied using the variable-angle spectroscopic ellipsometry and spectroscopic reflectometry. The structural model including the inhomogeneous thin film, transition layer, and identically rough boundaries was used to process the experimental data. The scalar diffraction theory was used to describe the influence of roughness. The influence of the scattered light registered by the spectrophotometer due to its finite acceptance angle was also taken into account. The thicknesses and optical constants of the inhomogeneous thin film and the transition layer were determined in the optical characterization together with the roughness parameters. The determined rms value of the heights of roughness was found to be in good agreement with values obtained using AFM. The results of the optical characterization of the studied inhomogeneous thin film with rough boundaries were also verified by comparing them with the results of the optical characterization of the inhomogeneous thin film prepared using the same deposition conditions but onto the substrate with a smooth surface. (C) 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement
KeywordsREFRACTIVE-INDEX, SPECTROSCOPIC ELLIPSOMETRY, SURFACE-ROUGHNESS, THICKNESS NONUNIFORMITY, STATISTICAL PROPERTIES, HEIGHT DISTRIBUTION, SILICON, REFLECTION, CONSTANTS, SYSTEM
Document typePeer reviewed
Document versionFinal PDF
SourceOPTICS EXPRESS. 2022, vol. 30, issue 2, p. 2033-2047.