Browsing Ústav fyzikálního inženýrství by Author "Hrabovský, Miloš"

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Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide

Gablech, Imrich; Svatoš, Vojtěch; Caha, Ondřej; Hrabovský, Miloš; Prášek, Jan; Hubálek, Jaromír; Šikola, Tomáš (Springer US, 2016-04-01)

We propose the ion-beam sputtering deposition providing Ti thin films of desired crystallographic orientation and smooth surface morphology not obtainable with conventional deposition techniques such as magnetron sputtering ...