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Srovnávací studie plazmonických antén vyrobených litografií elektronovým svazkem a iontovým svazkem

dc.contributor.authorHorák, Michalcs
dc.contributor.authorBukvišová, Kristýnacs
dc.contributor.authorŠvarc, Vojtěchcs
dc.contributor.authorJaskowiec, Jiřícs
dc.contributor.authorKřápek, Vlastimilcs
dc.contributor.authorŠikola, Tomášcs
dc.date.accessioned2020-08-04T11:02:59Z
dc.date.available2020-08-04T11:02:59Z
dc.date.issued2018-06-25cs
dc.identifier.citationScientific Reports. 2018, vol. 8, issue 1, p. 9640-9648.en
dc.identifier.issn2045-2322cs
dc.identifier.other148493cs
dc.identifier.urihttp://hdl.handle.net/11012/83813
dc.description.abstractWe present a comparative study of plasmonic antennas fabricated by electron beam lithography and direct focused ion beam milling. We have investigated optical and structural properties and chemical composition of gold disc-shaped plasmonic antennas on a silicon nitride membrane fabricated by both methods to identify their advantages and disadvantages. Plasmonic antennas were characterized using transmission electron microscopy including electron energy loss spectroscopy and energy dispersive X-ray spectroscopy, and atomic force microscopy. We have found stronger plasmonic response with better field confinement in the antennas fabricated by electron beam lithography, which is attributed to their better structural quality, homogeneous thickness, and only moderate contamination mostly of organic nature. Plasmonic antennas fabricated by focused ion beam lithography feature weaker plasmonic response, lower structural quality with pronounced thickness fluctuations, and strong contamination, both organic and inorganic, including implanted ions from the focused beam. While both techniques are suitable for the fabrication of plasmonic antennas, electron beam lithography shall be prioritized over focused ion beam lithography due to better quality and performance of its products.en
dc.formattextcs
dc.format.extent9640-9648cs
dc.format.mimetypeapplication/pdfcs
dc.language.isoencs
dc.publisherSpringer Naturecs
dc.relation.ispartofScientific Reportscs
dc.relation.urihttp://link.springer.com/article/10.1038/s41598-018-28037-1cs
dc.rightsCreative Commons Attribution 4.0 Internationalcs
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/cs
dc.subjectPlasmonic antennasen
dc.subjectelectron beam lithographyen
dc.subjectfocused ion beam lithographyen
dc.subjectelectron energy loss spectroscopyen
dc.subjectlocalized surface plasmon.en
dc.titleComparative study of plasmonic antennas fabricated by electron beam and focused ion beam lithographyen
dc.title.alternativeSrovnávací studie plazmonických antén vyrobených litografií elektronovým svazkem a iontovým svazkemcs
thesis.grantorVysoké učení technické v Brně. Fakulta strojního inženýrství. Ústav fyzikálního inženýrstvícs
thesis.grantorVysoké učení technické v Brně. Středoevropský technologický institut VUT. Sdílená laboratoř RP1cs
thesis.grantorVysoké učení technické v Brně. Středoevropský technologický institut VUT. Příprava a charakterizace nanostrukturcs
sync.item.dbidVAV-148493en
sync.item.dbtypeVAVen
sync.item.insts2020.08.04 13:02:59en
sync.item.modts2020.08.04 12:27:35en
dc.coverage.issue1cs
dc.coverage.volume8cs
dc.identifier.doi10.1038/s41598-018-28037-1cs
dc.rights.accessopenAccesscs
dc.rights.sherpahttp://www.sherpa.ac.uk/romeo/issn/2045-2322/cs
dc.type.driverarticleen
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen


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Creative Commons Attribution 4.0 International
Except where otherwise noted, this item's license is described as Creative Commons Attribution 4.0 International