High aspect ratio Parylene C micropillars formed by molding and ION-BEAM etching method
Loading...
Date
2022-03-21
ORCID
Advisor
Referee
Mark
Journal Title
Journal ISSN
Volume Title
Publisher
TANGER
Altmetrics
Abstract
This paper represents the molding and plasma etching method for developing a high aspect ratio parylene C pillar array. The silicon mold was fabricated using the modified Bosch process. The parylene was deposited by chemical vapor deposition into the silicone holes, followed by the etching of silicon to obtain the transparent membrane of hollow parylene C pillars. The etching method was initialized by transferring the pattern on the hard titanium mask via standard photolithography, followed by titanium etching. The oxygen plasma ion-milling of parylene C produced the flexible pillars standing on the silicon substrate. Both pillar arrays were characterized by scanning electron microscopy. Arrays of micropillars could be applicable for measuring cellular forces or as the bioinspired platform with modulated surface chemistry.
Description
Keywords
Citation
NANOCON Conference Proceedings - International Conference on Nanomaterials. 2022, p. 1-4.
https://www.confer.cz/nanocon/2021/4349-high-aspect-ratio-parylene-c-micropillars-for-cellular-force-measurement
https://www.confer.cz/nanocon/2021/4349-high-aspect-ratio-parylene-c-micropillars-for-cellular-force-measurement
Document type
Peer-reviewed
Document version
Published version
Date of access to the full text
Language of document
en