The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning

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dc.contributor.authorGloss, Jonášcs
dc.contributor.authorHorký, Michalcs
dc.contributor.authorKřižáková, Violacs
dc.contributor.authorFlajšman, Lukášcs
dc.contributor.authorSchmid, Michaelcs
dc.contributor.authorUrbánek, Michalcs
dc.contributor.authorVarga, Petercs
dc.coverage.issue1cs
dc.coverage.volume469cs
dc.date.accessioned2020-08-04T11:02:57Z
dc.date.available2020-08-04T11:02:57Z
dc.date.issued2019-03-01cs
dc.description.abstractWe have studied the growth of metastable face-centered-cubic, non-magnetic Fe78Ni22 thin films on silicon substrates. These films undergo a magnetic (paramagnetic to ferromagnetic) and structural (fcc to bcc) phase transformation upon ion beam irradiation and thus can serve as a material for direct writing of magnetic nanostructures by the focused ion beam. So far, these films were prepared only on single-crystal Cu(1 0 0) substrates. We show that transformable Fe78Ni22 thin films can also be prepared on a hydrogen-terminated Si(1 0 0) with a 130-nm-thick Cu(1 0 0) buffer layer. The H-Si(1 0 0) substrates can be prepared by hydrofluoric acid etching or by annealing at 1200 degrees C followed by adsorption of atomic hydrogen. The Cu(1 0 0) buffer layer and Fe78Ni22 fcc metastable thin film were deposited by thermal evaporation in ultra-high vacuum. The films were consequently transformed in-situ by 4 keV Ar+ ion irradiation and ex-situ by a 30 keV Ga+ focused ion beam, and their magnetic properties were studied by magneto-optical Kerr effect magnetometry. The substitution of expensive copper single crystal substrate by standard silicon wafers dramatically expands application possibilities of metastable paramagnetic thin films for focused-ion-beam direct magnetic patterning.en
dc.formattextcs
dc.format.extent747-752cs
dc.format.mimetypeapplication/pdfcs
dc.identifier.citationApplied Surface Science. 2019, vol. 469, issue 1, p. 747-752.en
dc.identifier.doi10.1016/j.apsusc.2018.10.263cs
dc.identifier.issn0169-4332cs
dc.identifier.other155301cs
dc.identifier.urihttp://hdl.handle.net/11012/180697
dc.language.isoencs
dc.publisherElseviercs
dc.relation.ispartofApplied Surface Sciencecs
dc.relation.urihttps://www.sciencedirect.com/science/article/pii/S0169433218330459?via%3Dihubcs
dc.rightsCreative Commons Attribution 4.0 Internationalcs
dc.rights.accessopenAccesscs
dc.rights.sherpahttp://www.sherpa.ac.uk/romeo/issn/0169-4332/cs
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/cs
dc.subjectMagnetic nanostructuresen
dc.subjectMetastable filmsen
dc.subjectfcc Feen
dc.subjectCu buffer layeren
dc.subjectSi(100)en
dc.titleThe growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterningen
dc.type.driverarticleen
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen
sync.item.dbidVAV-155301en
sync.item.dbtypeVAVen
sync.item.insts2020.08.04 13:02:57en
sync.item.modts2020.08.04 12:32:38en
thesis.grantorVysoké učení technické v Brně. Fakulta strojního inženýrství. Ústav fyzikálního inženýrstvícs
thesis.grantorVysoké učení technické v Brně. Středoevropský technologický institut VUT. Nanomagnetismus a spintronikacs
thesis.grantorVysoké učení technické v Brně. Středoevropský technologický institut VUT. Příprava a charakterizace nanostrukturcs
thesis.grantorVysoké učení technické v Brně. Středoevropský technologický institut VUT. Sdílená laboratoř RP1cs
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Ústav fyzikálního inženýrství
Nanomagnetismus a spintronika
Příprava a charakterizace nanostruktur
Sdílená laboratoř RP1