Optical characterization of inhomogeneous thin films with randomly rough boundaries

Simple item page
dc.contributor.authorVohánka, Jířícs
dc.contributor.authorOhlídal, Ivancs
dc.contributor.authorBuršíková, Vilmacs
dc.contributor.authorKlapetek, Petrcs
dc.contributor.authorKaur, Nupinder Jeetcs
dc.coverage.issue2cs
dc.coverage.volume30cs
dc.date.accessioned2022-08-05T10:52:55Z
dc.date.available2022-08-05T10:52:55Z
dc.date.issued2022-01-17cs
dc.description.abstractAn inhomogeneous polymer-like thin film was deposited by the plasma enhanced chemical vapor deposition onto silicon single-crystal substrate whose surface was roughened by anodic oxidation. The inhomogeneous thin film with randomly rough boundaries was created as a result. This sample was studied using the variable-angle spectroscopic ellipsometry and spectroscopic reflectometry. The structural model including the inhomogeneous thin film, transition layer, and identically rough boundaries was used to process the experimental data. The scalar diffraction theory was used to describe the influence of roughness. The influence of the scattered light registered by the spectrophotometer due to its finite acceptance angle was also taken into account. The thicknesses and optical constants of the inhomogeneous thin film and the transition layer were determined in the optical characterization together with the roughness parameters. The determined rms value of the heights of roughness was found to be in good agreement with values obtained using AFM. The results of the optical characterization of the studied inhomogeneous thin film with rough boundaries were also verified by comparing them with the results of the optical characterization of the inhomogeneous thin film prepared using the same deposition conditions but onto the substrate with a smooth surface. (C) 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreementen
dc.formattextcs
dc.format.extent2033-2047cs
dc.format.mimetypeapplication/pdfcs
dc.identifier.citationOPTICS EXPRESS. 2022, vol. 30, issue 2, p. 2033-2047.en
dc.identifier.doi10.1364/OE.447146cs
dc.identifier.issn1094-4087cs
dc.identifier.other178666cs
dc.identifier.urihttp://hdl.handle.net/11012/208222
dc.language.isoencs
dc.publisherOptica Publishing Groupcs
dc.relation.ispartofOPTICS EXPRESScs
dc.relation.urihttps://opg.optica.org/oe/fulltext.cfm?uri=oe-30-2-2033&id=467886cs
dc.rights(C) Optica Publishing Groupcs
dc.rights.accessopenAccesscs
dc.rights.sherpahttp://www.sherpa.ac.uk/romeo/issn/1094-4087/cs
dc.subjectREFRACTIVE-INDEXen
dc.subjectSPECTROSCOPIC ELLIPSOMETRYen
dc.subjectSURFACE-ROUGHNESSen
dc.subjectTHICKNESS NONUNIFORMITYen
dc.subjectSTATISTICAL PROPERTIESen
dc.subjectHEIGHT DISTRIBUTIONen
dc.subjectSILICONen
dc.subjectREFLECTIONen
dc.subjectCONSTANTSen
dc.subjectSYSTEMen
dc.titleOptical characterization of inhomogeneous thin films with randomly rough boundariesen
dc.type.driverarticleen
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen
sync.item.dbidVAV-178666en
sync.item.dbtypeVAVen
sync.item.insts2022.08.05 12:52:54en
sync.item.modts2022.08.05 12:14:30en
thesis.grantorVysoké učení technické v Brně. Středoevropský technologický institut VUT. Vývoj metod analýzy a měřenícs
Files
Original bundle
Now showing 1 - 1 of 1
Thumbnail Image
Name:
oe3022033.pdf
Size:
2.78 MB
Format:
Adobe Portable Document Format
Description:
oe3022033.pdf
Download
Collections
Vývoj metod analýzy a měření