Dielectric properties of nanostructured mixed-oxide films formed by anodizing Al/Zr bilayers

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dc.contributor.authorSepĂșlveda SepĂșlveda, Lina Marcelacs
dc.contributor.authorKamnev, Kirillcs
dc.contributor.authorMozalev, Alexandercs
dc.date.accessioned2021-12-14T11:55:13Z
dc.date.available2021-12-14T11:55:13Z
dc.date.issued2021-01-01cs
dc.description.abstractZrO2 is a ceramic material suitable for high-temperature coatings, fuel cells as a solid proton-conducting electrolyte, and metal-oxide-semiconductor devices due to its recently explored promising dielectric properties. In this work, anodic nanostructured ZrO2-Al2O3 mixed films were synthesized on substrates via anodizing/reanodizing of a thin Zr layer through a porous anodic alumina (PAA) film at 40/240 V in 0.6 M (COOH)(2) and characterized by scanning electron microscopy and electrochemical impedance spectroscopy (EIS) including the measurements under various bias potentials. The films are composed of ZrO2 nanofingers penetrating the alumina pores, partially mixing with Al2O3. Nanofingers are anchored to a ZrO2 bottom-oxide nanofilm that forms under the PAA during anodization. The EIS reveals a nearly ideal dielectric behavior of the ZrO2-Al2O3 mixed-oxide nanostructured films. After dissolution of the PAA layer, the dielectric properties of the remaining zirconium oxide film become slightly worse, due to the specific structure and deviation from perfect stoichiometry. The ZrO2-Al2O3 mixed-oxide nanostructured film permittivity is calculated to be 11, which is higher than that of alumina (9.8) due to the contribution of ZrO2 nanofingers grown in the alumina nanopores. After the PAA dissolution, the film permittivity increases substantially, up to 46, which is twice the permittivity of ZrO2 (22) grown anodically on zirconium metal in a classical way. The ZrO2-Al2O3 mixed-oxide nanostructured films prepared via the PAA-assisted anodization are of high interest for potential application to various types of capacitors due to their near-ideal dielectric properties. The unique dielectric behavior of the PAA-dissolved ZrO2 film deserves detailed investigation in a future work.en
dc.formattextcs
dc.format.extent44-49cs
dc.format.mimetypeapplication/pdfcs
dc.identifier.citationProceedings 12th International Conference on Nanomaterials - Research & Application. 2021, p. 44-49.en
dc.identifier.doi10.37904/nanocon.2020.3693cs
dc.identifier.isbn978-80-87294-98-7cs
dc.identifier.other174115cs
dc.identifier.urihttp://hdl.handle.net/11012/203207
dc.language.isoencs
dc.publisherTANGER LTDcs
dc.relation.ispartofProceedings 12th International Conference on Nanomaterials - Research & Applicationcs
dc.relation.urihttps://www.confer.cz/nanocon/2020/3693-dielectric-properties-of-nanostructured-mixed-oxide-films-formed-by-anodizing-al-zr-bilayerscs
dc.rightsCreative Commons Attribution 4.0 Internationalcs
dc.rights.accessopenAccesscs
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/cs
dc.subjectAnodizingen
dc.subjectzirconium oxideen
dc.subjectporous anodic aluminaen
dc.subjectdielectricen
dc.titleDielectric properties of nanostructured mixed-oxide films formed by anodizing Al/Zr bilayersen
dc.type.driverconferenceObjecten
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen
sync.item.dbidVAV-174115en
sync.item.dbtypeVAVen
sync.item.insts2021.12.14 12:55:13en
sync.item.modts2021.12.14 12:16:43en
thesis.grantorVysokĂ© učenĂ­ technickĂ© v Brně. StƙedoevropskĂœ technologickĂœ institut VUT. ChytrĂ© nanonĂĄstrojecs
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